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PECVD system for deposition of Si, SiGe & Ge nanowires & carbon nanotubes
Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of carbon nanotubes (CNTs) and Si, SiGe and Ge nanowires. CNT growth temperatures are typically between 600 and 800C. Aligned growth of CNTs can be achieved with a growth rate up to 40 nm/min and random growth can be achieved with growth rates up to hundreds of nm/min. CNT diameters are typically less than 100nm, but depend on catalyst particle size. Silicon nanowires typically require silane for growth at temperatures of 330 - 650C, and vertical growth rates up to 150nm/min can be achieved. Germanium nanowires typically require germane for growth. SiGe nanowires can be grown by mixing silane and germane Heterojunctions can be created in the SiGe nanowires by appropriate control of the flows. All nanowires can be doped p or n type with the addition of diborane or phosphine to a process.
Modified Chemical Vapour Desposition (MCVD) lathe
There are 2 chemical vapour deposition (MCVD) lathes, a glassworking lathe, and dedicated chemical preparation areas for glass doping, etching and machining.