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The Silica Fibre facilities occupy over 160m2 of class 10,000 cleanroom space and comprises state-of-the-art fabrication equipment complemented by cutting-edge process advances. The facility includes modified-chemical-vapour-deposition (MCVD) lathe, outside-vapour-deposition (OVD) equipment, a six metre high dual-sided fibre drawing tower and dedicated chemical preparation areas for glass etching and machining. The facility is capable of producing industry standard passive and active preforms and fibres, and a wide variety of specialist fibres with complex structures, enabling research into high-power fibre lasers and advanced telecommunications and sensing devices. Complete post-processing and characterisation of silica fibre includes preform and fibre index profilers, fibre proof-testing and high-resolution OTDR.
Our expert technical and academic staff closely work with a range of partners to meet their specific device and materials fabrication requirements.
Find out more about our silica fibre services.